About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Picosun SUNALE R-150B Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Picosun SUNALE R-150B hardware returned 14 records.

NumberTitle
1Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
2Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
3Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
4Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
5Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
6A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
7MANOS performance dependence on ALD Al2O3 oxidation source
8A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
9Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
10Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
11Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
12Tribological properties of thin films made by atomic layer deposition sliding against silicon
13Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
14Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity