HfSiO_x Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing HfSiO_x films returned 16 record(s).

Number	Title
1	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
2	Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
3	Annealing behavior of ferroelectric Si-doped HfO₂ thin films
4	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
5	Band Offsets for Atomic Layer Deposited HfSiO₄ on (Al_0.14Ga_0.86)₂O₃
6	Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
7	Optical properties and bandgap evolution of ALD HfSiO_x films
8	The effects of layering in ferroelectric Si-doped HfO₂ thin films
9	Ferroelectric phenomena in Si-doped HfO₂ thin films with TiN and Ir electrodes
10	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi_1-xO_y on InGaZnO₄
11	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N₂ and N₂O Plasma Post-Treatments
12	High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
13	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO₂ thin films
14	Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
15	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
16	Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing

HfSiOx Plasma Enhanced Atomic Layer Deposition Film Publications