TDMAAl, (Me2N)4Al, [(CH3)2N]4Al, Tetrakis(DiMethylAmido) Aluminum, Aluminum Dimethylamide, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

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1A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs


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