TDMAAl, (Me2N)4Al, [(CH3)2N]4Al, Tetrakis(DiMethylAmido) Aluminum, Aluminum Dimethylamide, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs


Shortcuts



© 2014-2019 plasma-ald.com