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TDMAA, TDMAAl, Tetrakis[DiMethylAmido]Aluminum, Tetrakis[DiMethylAmino]Aluminum, Aluminum Dimethylamide, [Me2N]4Al, [(CH3)2N]4Al, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs


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