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Electron Density, ne Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Electron Density, ne returned 17 record(s).

NumberTitle
1The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
2Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
3Atomic Layer Deposition of the Conductive Delafossite PtCoO2
4Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
5Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
6Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
7Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
8Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
9Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
10Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
11Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
12Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
13Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
14Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
15Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
16Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature
17Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods