Inductively coupled plasma sources from Plasma ALD, LLC.

Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.

Contact us for more information.

Electron Density, ne Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Electron Density, ne returned 17 record(s).

Number	Title
1	Atomic Layer Deposition of the Conductive Delafossite PtCoO₂
2	Thermal Stability of ALD HfO₂ Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
3	Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
4	Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
5	Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
6	Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature
7	Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
8	Effects of N₂ remote plasma nitridation on the structural and electrical characteristics of the HfO₂ gate dielectrics grown using remote plasma atomic layer deposition methods
9	Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
10	Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
11	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
12	Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
13	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
14	Atomic Layer Deposition Al₂O₃ Thin Films in Magnetized Radio Frequency Plasma Source
15	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
16	Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
17	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides