Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy HfTB, Hf[OC(Me)3]4, Hf[OC(CH3)3]4, Hafnium tetra-tert-butoxide CAS# 2172-02-3

HfTB, Hf[OC(Me)3]4, Hf[OC(CH3)3]4, Hafnium tetra-tert-butoxide CAS# 2172-02-3 is available from the following source(s):

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Hafnium(IV) t-butoxide (99.9%-Hf, <1.5%-Zr)
2Pegasus Chemicals🇬🇧Hafnium tert-butoxide
3Ereztech🇺🇸Hafnium (IV) tert-butoxide

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