Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Where to buy Bis(isopropyl cyclopentadienyl) tungsten(IV) dihydride, WH2(iPrCp)2 CAS# 64561-25-7

Bis(isopropyl cyclopentadienyl) tungsten(IV) dihydride, WH2(iPrCp)2 CAS# 64561-25-7 is available from the following source(s):

NumberVendorRegionLink
1Sigma-Aldrich, Co. LLC🇺🇸Bis(isopropylcyclopentadienyl)tungsten(IV) dihydride
2Ereztech🇺🇸Bis(isopropylcyclopentadienyl) tungsten(IV) dihydride

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