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Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
Self-limiting diamond growth from alternating CFx and H fluxes
Sub-10-nm ferroelectric Gd-doped HfO2 layers
Where to buy DiMethoxyDiMethylSilane DMDMS, (CH3)2(OCH3)2Si CAS# 1112-39-6
DiMethoxyDiMethylSilane DMDMS, (CH3)2(OCH3)2Si CAS# 1112-39-6 is available from the following source(s):
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | Ereztech | 🇺🇸 | Dimethoxydimethylsilane |
| 2 | Pegasus Chemicals | 🇬🇧 | Dimethyldimethoxysilane |
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