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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Where to buy Tetraethyl Tin, Tetraethyltin, Et4Sn, (CH3CH2)4Sn, (C2H5)4Sn CAS# 597-64-8
Tetraethyl Tin, Tetraethyltin, Et4Sn, (CH3CH2)4Sn, (C2H5)4Sn CAS# 597-64-8 is available from the following source(s):
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | Ereztech | 🇺🇸 | Tetraethyltin |
| 2 | DOCK/CHEMICALS | 🇩🇪 | Tetraethyltin |
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