Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Where to buy La(TMHD)3, La(THD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) lanthanum, Lanthanum dipivaloylmethanate CAS# 14319-13-2

La(TMHD)3, La(THD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) lanthanum, Lanthanum dipivaloylmethanate CAS# 14319-13-2 is available from the following source(s):

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum(III), 99% (99.9%-La) [La(TMHD)3]
2EreztechπŸ‡ΊπŸ‡Έ2,2,6,6-Tetramethyl-3,5-heptanedionate lanthanum(III)
3Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(2,2,6,6-tetramethylheptane-3,5-dionato)lanthanum
4GelestπŸ‡ΊπŸ‡ΈLanthanum 2,2,6,6-Tetramethyl-3,5-Heptanedionate

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