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Introducing Plasma ALD, LLC's first in-house product. |
An economical, compact inductively coupled plasma source. |
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Ideal for: |
- Plasma-Enhanced Atomic Layer Deposition
- Thin Film Etch
- Surface cleaning
- Surface modification
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Contact us for more information. |
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Where to buy La(TMHD)3, La(THD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) lanthanum, Lanthanum dipivaloylmethanate CAS# 14319-13-2
La(TMHD)3, La(THD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) lanthanum, Lanthanum dipivaloylmethanate CAS# 14319-13-2 is available from the following source(s):
| Number | Vendor | Region | Link |
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| 1 | Strem Chemicals, Inc. | πΊπΈ | Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum(III), 99% (99.9%-La) [La(TMHD)3] |
| 2 | Ereztech | πΊπΈ | 2,2,6,6-Tetramethyl-3,5-heptanedionate lanthanum(III) |
| 3 | Pegasus Chemicals | π¬π§ | Tris(2,2,6,6-tetramethylheptane-3,5-dionato)lanthanum |
| 4 | Gelest | πΊπΈ | Lanthanum 2,2,6,6-Tetramethyl-3,5-Heptanedionate |
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