Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy copper(II) hexafluoroacetylacetonate, Cu(HFAC)2 CAS# 155640-85-0

copper(II) hexafluoroacetylacetonate, Cu(HFAC)2 CAS# 155640-85-0 is available from the following source(s):

NumberVendorRegionLink
1Ereztech🇺🇸Copper(II) hexafluoroacetylacetonate hydrate
2Strem Chemicals, Inc.🇺🇸Copper(II) hexafluoroacetylacetonate, anhydrous, elec. gr. (99.99+%-Cu) PURATREM
3Strem Chemicals, Inc.🇺🇸Copper (II) hexafluoroacetylacetonate hydrate, elec. gr. (99.99+%-Cu) PURATREM

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