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Introducing Plasma ALD, LLC's first in-house product. |
An economical, compact inductively coupled plasma source. |
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Ideal for: |
- Plasma-Enhanced Atomic Layer Deposition
- Thin Film Etch
- Surface cleaning
- Surface modification
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Contact us for more information. |
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Where to buy 3DMAB, TDMAB, (Me2N)3B, (CH3)2N)3B, Tris(dimethylamido)borane CAS# 4375-83-1
3DMAB, TDMAB, (Me2N)3B, (CH3)2N)3B, Tris(dimethylamido)borane CAS# 4375-83-1 is available from the following source(s):
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