Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



About plasma-ald.com

I have been working on plasma-enhanced atomic layer deposition since 2008. There was already a decent set of relevant publications at that time but not so many that you could not keep track of what had been done in a spreadsheet. Interest in the technique really began to ramp up around then and keeping up with the publications was getting more challenging. Finding the available reference management software options lacking, I developed a web-based, relational database and website frontend based on HTML5, MySQL, and PHP. This went live in May 2014 and I have been adding new publications ever since.