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Deposition Kinetics, Reaction Mechanism Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Deposition Kinetics, Reaction Mechanism returned 21 record(s).

NumberTitle
1Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
2Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
3Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facets
4Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
5Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
6Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
7Room-Temperature Atomic Layer Deposition of Platinum
8Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
9Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
10RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
11Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
12Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
13Reactions of ruthenium cyclopentadienyl precursor in the metal precursor pulse of Ru atomic layer deposition
14RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
15Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
16Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
17Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C
18Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
19Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
20RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
21The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process