Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facets
Type:
Journal
Info:
J. Phys. Chem. C, 2020, 124 (22), pp 11990-12000
Date:
2020-05-12
Author Information
| Name | Institution |
|---|---|
| Ji Liu | Tyndall National Institute, University College Cork |
| Hong Liang Lu | Fudan University |
| David Wei Zhang | Fudan University |
| M. G. Nolan | Tyndall National Institute, University College Cork |
Films
Plasma Co
Film/Plasma Properties
Characteristic: Surface Reactions
Analysis: -
Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: -
Substrates
| Co |
Notes
| 1506 |