About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Optical Absorption Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Optical Absorption returned 13 record(s).

NumberTitle
1Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
2HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
3Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
4Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
5Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
6Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
7Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
8Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
9Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
10Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
11Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
12In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition