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Kensaku Kanomata Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Kensaku Kanomata returned 16 record(s).

NumberTitle
1Room temperature atomic layer deposition of TiO2 on gold nanoparticles
2Temperature-controlled atomic layer deposition of GaN using plasma-excited nitrogen source
3Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
4Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
5Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
6Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
7RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
8Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
9Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
10Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
11Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
12Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
13RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
14Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
15Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
16RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor