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Gijs Dingemans Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Gijs Dingemans returned 15 record(s).

NumberTitle
1Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
2Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
3Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
4Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
5Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
6Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
7'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
8Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
9Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
10Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
11Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
12Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
13Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
14Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
15Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film