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Gijs Dingemans Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Gijs Dingemans returned 15 record(s).

NumberTitle
1Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
2Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
3Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
4Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
5Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
6Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
7Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
8Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
9Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
10'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
11Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
12Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
13Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
14Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
15Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface