TaCN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TaCN films returned 13 record(s).

Number	Title
1	A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
3	The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
4	TaCN growth with PDMAT and H₂/Ar plasma by plasma enhanced atomic layer deposition
5	Chemical Reaction Mechanism in the Atomic Layer Deposition of TaC_xN_y Films Using tert-Butylimidotris(diethylamido)tantalum
6	Effective work function tunability and interfacial reactions with underlying HfO₂ layer of plasma-enhanced atomic layer deposited TaC_xN_y films
7	Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
8	Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
9	Interface and plasma damage analysis of PEALD TaCN deposited on HfO₂ for advanced CMOS studied by angle resolved XPS and C-V
10	In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
11	Evaluation of plasma parameters on PEALD deposited TaCN
12	Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
13	Improved electrical performances of plasma-enhanced atomic layer deposited TaC_xN_y films by adopting Ar/H₂ plasma