TaCN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TaCN films returned 13 record(s).

Number	Title
1	Interface and plasma damage analysis of PEALD TaCN deposited on HfO₂ for advanced CMOS studied by angle resolved XPS and C-V
2	Improved electrical performances of plasma-enhanced atomic layer deposited TaC_xN_y films by adopting Ar/H₂ plasma
3	Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
4	Effective work function tunability and interfacial reactions with underlying HfO₂ layer of plasma-enhanced atomic layer deposited TaC_xN_y films
5	Evaluation of plasma parameters on PEALD deposited TaCN
6	A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
7	Chemical Reaction Mechanism in the Atomic Layer Deposition of TaC_xN_y Films Using tert-Butylimidotris(diethylamido)tantalum
8	Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
9	The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
10	TaCN growth with PDMAT and H₂/Ar plasma by plasma enhanced atomic layer deposition
11	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
12	In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
13	Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties