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HfN_x Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing HfN_x films returned 13 record(s).

Number	Title
1	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
2	Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
3	Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
4	A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
5	Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
6	Highly Conductive HfN_x Films Prepared by Plasma-Assisted Atomic Layer Deposition
7	Plasma-Assisted ALD of Highly Conductive HfN_x: On the Effect of Energetic Ions on Film Microstructure
8	HfO₂/HfO_xN_y/HfO₂ Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
9	Low resistivity HfN_x grown by plasma-assisted ALD with external rf substrate biasing
10	Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
11	Plasma-assisted atomic layer deposition of HfN_x: Tailoring the film properties by the plasma gas composition
12	Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
13	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties