Inductively coupled plasma sources from Plasma ALD, LLC.


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Ion Energy Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Ion Energy returned 13 record(s).

NumberTitle
1Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
2Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
3The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
4Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
5Innovative remote plasma source for atomic layer deposition for GaN devices
6Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
7Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
8Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
9Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
10Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
11Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
12Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
13Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties