Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Claudia Richter Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Claudia Richter returned 3 record(s).

NumberTitle
1Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
2Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
3Breakdown and Protection of ALD Moisture Barrier Thin Films