Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Ziwen Fang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Ziwen Fang returned 4 record(s).

NumberTitle
1A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
2Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
3Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
4Gadolinium nitride films deposited using a PEALD based process