S. M. Rossnagel Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by S. M. Rossnagel returned 10 record(s).

Number	Title
1	Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
2	The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
3	The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
4	Plasma Modeling of a PEALD System for the Deposition of TiO₂ and HfO₂
5	Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
6	Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
7	Robust TaN_x diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
8	Oxygen migration in TiO₂-based higher-k gate stacks
9	Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
10	Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition