Honggyu Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Honggyu Kim returned 6 record(s).

Number	Title
1	Atomic layer deposited HfO₂/HfSi_xO_yN_z stacked gate dielectrics for metal-oxide-semiconductor structures
2	Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO₂ for Nonvolatile Memory Devices
3	Characteristics of Atomic-Layer-Deposited HfO₂ Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
4	The Effects of Annealing Ambient on the Characteristics of La₂O₃ Films Deposited by RPALD
5	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N₂ and N₂O Plasma Post-Treatments
6	Effects of an Al₂O₃ capping layer on La₂O₃ deposited by remote plasma atomic layer deposition