iOV d150, iSAC Co. Ltd. Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using iOV d150, iSAC Co. Ltd. hardware returned 3 records.

Number	Title
1	Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
2	Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
3	Chemistry of SiN_x thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N₂ plasma