HfON Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing HfON films returned 9 record(s).

Number	Title
1	Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H₂ and NH₃ plasma treated interfacial layers
2	HfO₂/HfO_xN_y/HfO₂ Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
3	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
4	Electrical and physical characteristics of high-k gated MOSFETs with in-situ H₂O and O₂ plasma formed interfacial layer
5	Effect of Buffer Layer for HfO₂ Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
6	Improvement in electrical characteristics of HfO₂ gate dielectrics treated by remote NH₃ plasma
7	Characterization of HfO_xN_y thin film formation by in-situ plasma enhanced atomic layer deposition using NH₃ and N₂ plasmas
8	The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfO_xN_y prepared by in situ nitridation
9	Electrical Properties of Atomic Layer Deposition HfO₂ and HfO_xN_y on Si Substrates with Various Crystal Orientations