Surface oxidation model in plasma enhanced atomic layer deposition for silicon oxide films including various aminosilane precursors

Type:

Journal

Info:

Journal of Vacuum Science & Technology A 37, 020920 (2019)

Date:

2019-01-17

DOI:

http://dx.doi.org/10.1116/1.5078537

Author Information

Name	Institution
Kosuke Yamamoto	Tokyo Electron Technology Solutions, Ltd.
Ayuta Suzuki	Tokyo Electron Technology Solutions, Ltd.
Munehito Kagaya	Tokyo Electron Technology Solutions, Ltd.
Masaaki Matsukuma	Tokyo Electron Technology Solutions, Ltd.
Tsuyoshi Moriya	Tokyo Electron Technology Solutions, Ltd.

Hardware used: Unknown

Deposition Temperature Range N/A

Numerical modeling work with O₂ plasma and aminosilanes.
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