About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Oxide Vertical TFTs for the Application to the Ultra High Resolution Display

Type:
Journal
Info:
60-3: Distinguished Paper, 2016 SID Symposium Digest of Technical Papers
Date:
2016-05-25
DOI:
http://dx.doi.org/10.1002/sdtp.10799

Author Information

Name Institution
Hye In YeomKorea Advanced Institute of Science and Technology
Geumbi MoonKorea Advanced Institute of Science and Technology
Yun Yong NamKorea Advanced Institute of Science and Technology
Jong Beom KoKorea Advanced Institute of Science and Technology
Seung-Hee LeeKorea Advanced Institute of Science and Technology
Junyong ChoeKorea Advanced Institute of Science and Technology
Jihoon ChoiElectronics and Telecommunication Research Institute, (ETRI)
Chi Sun HwangElectronics and Telecommunication Research Institute, (ETRI)
Sang-Hee Ko ParkElectronics and Telecommunication Research Institute, (ETRI)

Films

Plasma In2O3

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

788