About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Chee Wee Liu Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Chee Wee Liu returned 4 record(s).

NumberTitle
1Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
2Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
3Passivation of Al2O3/TiO2 on monocrystalline Si with relatively low reflectance
4Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si