Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Tong Liu Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Tong Liu returned 2 record(s).

NumberTitle
1Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
2Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity