Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Richard Potter Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Richard Potter returned 3 record(s).

NumberTitle
1Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
2Gadolinium nitride films deposited using a PEALD based process
3A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films