Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Yao-Feng Chang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Yao-Feng Chang returned 2 record(s).

NumberTitle
1SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
2A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems