Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

S. B. S. Heil Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by S. B. S. Heil returned 13 record(s).

NumberTitle
1Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
2In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
3Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
4Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
5Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
6Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
7Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
8Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
9Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
10In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
11Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
12Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
13Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry