About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

E.V. Nikitina Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by E.V. Nikitina returned 5 record(s).

NumberTitle
1n-GaP/p-Si Heterojunction Solar Cells Fabricated by PE-ALD
2Study of GaP/Si Heterojunction Solar Cells
3Low temperature plasma enhanced deposition of GaP films on Si substrate
4Thin film GaP for solar cell application
5Influence of PE-ALD of GaP on the Silicon Wafers Quality