Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Changhwan Choi Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Changhwan Choi returned 3 record(s).

NumberTitle
1Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
2In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
3Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors