Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Marc Schaekers Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Marc Schaekers returned 3 record(s).

NumberTitle
1Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
2Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
3Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers