Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Tetsuo Narita Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Tetsuo Narita returned 2 record(s).

NumberTitle
1Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
2Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy