Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Norihiko Ikeda Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Norihiko Ikeda returned 3 record(s).

NumberTitle
1Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
2Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
3Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition