Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Michael Barth Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Michael Barth returned 2 record(s).

NumberTitle
1High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
2Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation