Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Do Youl Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Do Youl Kim returned 3 record(s).

NumberTitle
1Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
2Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
3Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma