Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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IQE, Internal Quantum Efficiency Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing IQE, Internal Quantum Efficiency returned 2 record(s).

NumberTitle
1Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
2Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer