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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

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Development of a multianalyte optical sol-gel biosensor for medical diagnostic

Type:
Journal
Info:
Sensors and Actuators B: Chemical Volume 221, 31 December 2015, Pages 96-103
Date:
2015-06-01
DOI:
http://dx.doi.org/10.1016/j.snb.2015.06.012

Author Information

Name Institution
M. OubahaDublin City University
A. GorinDublin City University
C. McDonaghDublin City University
B. DuffyDublin Institute of Technology
R. CopperwhiteDublin City University

Films

Plasma Ta2O5

Hardware used: Applied Materials 300mm ALD
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

451