Negative differential resistance in the I-V curves of Al2O3/AlGaN/GaN MIS structures

Type:
Journal
Info:
RSC Adv., 2016, 6, 5671-5676
Date:
2016-01-04
DOI:
http://dx.doi.org/10.1039/C5RA22356C

Author Information

Name Institution
Lingyan ShenChinese Academy of Sciences
Xinhong ChengChinese Academy of Sciences
Zhongjian WangChinese Academy of Sciences
Duo CaoChinese Academy of Sciences
Li ZhengChinese Academy of Sciences
Qian WangChinese Academy of Sciences
Dongliang ZhangChinese Academy of Sciences
Jingjie LiChinese Academy of Sciences
Yuehui YuChinese Academy of Sciences

Films

Plasma Al2O3

Hardware used: Unknown
Deposition Temperature = 200C

Film/Plasma Properties

Substrates

Notes

616