Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Seung-Chul Ha Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Seung-Chul Ha returned 1 record(s).

NumberTitle
1Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate