Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Wei-Min Chung Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Wei-Min Chung returned 1 record(s).

NumberTitle
1SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition