Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Shih-Hsien Huang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Shih-Hsien Huang returned 2 record(s).

NumberTitle
1Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
2Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells