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Ming-lun Chang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Ming-lun Chang returned 2 record(s).

NumberTitle
1Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
2Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma