Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Ya-Hsi Hwang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Ya-Hsi Hwang returned 2 record(s).

NumberTitle
1GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
2High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors