Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Sylvain Le Gall Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Sylvain Le Gall returned 2 record(s).

NumberTitle
1Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
2Capacitance characterization of GaP/n-Si structures grown by PE-ALD