Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

S. N. Polyakov Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by S. N. Polyakov returned 1 record(s).

NumberTitle
1Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks